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Principles of Vapor Deposition of Thin Films

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  • 1176 páginas
  • 42 horas de lectura

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The goal of producing devices that are smaller, faster, and more functional has given thin film processing a unique role in technology. This work aims to provide the foundation upon which thin film science and technological innovation are possible. It offers derivation of important formulae, and covers the basic principles of materials science.

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Principles of Vapor Deposition of Thin Films, Professor K. S. Sree Harsha

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Publicado en
2005
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