Este es el que agregas al carrito
Más información sobre el libro
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Compra de libros
Atomic Layer Deposition, Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, Arthur Sherman
- Idioma
- Publicado en
- 2013
- product-detail.submit-box.info.binding
- (Tapa dura),
- Estado del libro
- Dañado
- Precio
- 166,31 €
Métodos de pago
Nadie lo ha calificado todavía.
- Título
- Atomic Layer Deposition
- Subtítulo
- Principles, Characteristics, and Nanotechnology Applications - 2nd Edition
- Idioma
- Inglés
- Editorial
- Wiley-Scrivener
- Publicado en
- 2013
- Formato
- Tapa dura
- Páginas
- 272
- ISBN10
- 1118062779
- ISBN13
- 9781118062777
- Serie
- Etiquetas
- EE.UU., Tecnología, Química, Teorías científicas, Nanotecnología, Rey Arturo, Aplicaciones
- Descripción
- Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.