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This thesis investigates the feasibility of using spectroscopic analysis of plasma emission for monitoring laser processing. It examines the effects of acquisition conditions and processing parameters on emission spectra. The study includes applications for sample classification, focus position supervision, and selective scribing of solar cells, demonstrating the potential of plasma emission analysis in this context.
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Spectroscopic Investigations of Plasma Emission Induced during Laser Material Processing, David Diego Vallejo
- Idioma
- Publicado en
- 2014
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